Femtosecond laser fabrication of high reflectivity micromirrors

Author(s)
Daniel Brodoceanu, Garrett Cole, Nikolai Kiesel, Markus Aspelmeyer, Dieter Bäuerle
Abstract

High-quality freestanding micromirrors consisting of 40 dielectric layers on silicon have been fabricated by ultrashort-pulse laser ablation in combination with laser-assisted wet chemical etching. Backside material removal enables direct access to both faces of the dielectric coating. The amplitude reflectance of the micromirrors has been determined by Fabry-Peacuterot interferometry; a finesse in excess of 8900 +/- 700, corresponding to a reflectivity exceeding 99.95%, has been found. The mechanical quality factor, Q, of the microresonators, measured at 20 K, is determined to be between 5000 and 6000.

Organisation(s)
Quantum Optics, Quantum Nanophysics and Quantum Information
External organisation(s)
Johannes Kepler Universität Linz
Journal
Applied Physics Letters
Volume
97
No. of pages
3
ISSN
0003-6951
DOI
https://doi.org/10.1063/1.3467846
Publication date
2010
Peer reviewed
Yes
Austrian Fields of Science 2012
103026 Quantum optics, 210006 Nanotechnology, 103025 Quantum mechanics, 203017 Micromechanics
Portal url
https://ucrisportal.univie.ac.at/en/publications/ba756e13-0579-4d49-a108-ade45deb9fd8